The Zeiss Crossbeam 540 is a Dual Beam microscope combining a field emission SEM and advanced FIB.
The Crossbeam was installed in 2017 as part of the Sputter Deposition and Nanoscale Patterning facility in the Cambridge hub of the Henry Royce Institute for Materials Science and Innovation.
This instrument provides a unique capability for 3D heterostructure fabrication which can generate novel magnetic and optical materials systems.
Facilities available on this instrument include: Gas deposition nozzle with Water, SiO2, XeF2 Platinum, and Carbon and H2O. Kleindiek lift-out system.